这一过程被业界称为CMP（Chemical Mechanical Polishing），即化学机械抛光。在这一过程中，抛光液是不可或缺的重要材料，对提升产品性能起着至关重要 ...

Fujifilm is expanding its chemical-mechanical planarization (CMP) polishing agent production in Japan to meet the rising demand for AI chips in Asia. This expansion will increase production by 30% ...

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Cleaning compounds often have a higher or lower pH (mildly alkaline or acidic) than pure polishing or color buffing compounds. Cleaning compounds may also contain detergents, surfactants and/or soaps.